Germany – Printed circuits – Maskless Aligner

In our research group, nanoscopic superconducting circuits are created using lithographic processes on 4-inch wafers. The structures are currently created on photomasks in a fixed design and then transferred to the substrate using photolithography. In order to significantly accelerate the design process of the superconducting circuits, we want to write the structures directly onto the substrate in the future using a maskless aligner.